Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM) images, visual inspection of SEM image also off...

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Bibliographic Details
Main Authors: Tao Zhou, Xuelong Shi, Chen Li, Yan Yan, Bowen Xu, Shoumian Chen, Yuhang Zhao, Wenzhan Zhou, Kan Zhou, Xuan Zeng
Format: Article
Language:English
Published: JommPublish 2021-03-01
Series:Journal of Microelectronic Manufacturing
Subjects:
sem images
contour extraction
machine leaning (ml)
deep convolution neural network (dcnn)
edge placement variation
Online Access:http://www.jommpublish.org/p/70/

Internet

http://www.jommpublish.org/p/70/

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