Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

We present a method to produce small pitch gratings for X-ray interferometric imaging applications, allowing the phase sensitivity to be increased and/or the length of the laboratory setup to be minimized. The method is based on fabrication of high aspect ratio silicon microstructures using deep rea...

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Bibliographic Details
Main Authors: Konstantins Jefimovs, Joan Vila-Comamala, Carolina Arboleda, Zhentian Wang, Lucia Romano, Zhitian Shi, Matias Kagias, Marco Stampanoni
Format: Article
Language:English
Published: MDPI AG 2021-05-01
Series:Micromachines
Subjects:
X-ray interferometry
phase contrast imaging
grating
high aspect ratio
deep reactive ion etching
Bosch process
Online Access:https://www.mdpi.com/2072-666X/12/5/517

Internet

https://www.mdpi.com/2072-666X/12/5/517

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