Nano-proximity direct ion beam writing
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line dep...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2016-02-01
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| Series: | Nanofabrication |
| Subjects: | |
| Online Access: | http://www.degruyter.com/view/j/nanofab.2015.2.issue-1/nanofab-2015-0006/nanofab-2015-0006.xml?format=INT |