Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses

Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses

Silicon suboxide (SiO<i><sub>x</sub></i>, <i>x</i> ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO<sub>2</sub>) by annealing in air at ~1000 °C. We demonstrate that...

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Bibliographic Details
Main Authors: Tatsuyoshi Takaya, Godai Miyaji, Issei Takahashi, Lukas Janos Richter, Jürgen Ihlemann
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Nanomaterials
Subjects:
femtosecond laser
laser ablation
nanostructure formation
surface plasmon polaritons
near-field
silicon suboxide
Online Access:https://www.mdpi.com/2079-4991/10/8/1495

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https://www.mdpi.com/2079-4991/10/8/1495

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