Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm<sup>2</sup> Using Total Reflection Mirrors

Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm<sup>2</sup> Using Total Reflection Mirrors

A nanofocusing optical system—referred to as <i>100 exa</i>—for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm<sup>2</sup> (10<sup>20</sup> W/cm<sup>2</sup>) using total reflection mirrors. The sy...

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Bibliographic Details
Main Authors: Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Makina Yabashi, Haruhiko Ohashi
Format: Article
Language:English
Published: MDPI AG 2020-04-01
Series:Applied Sciences
Subjects:
hard X-ray nano-focusing
high intensity XFEL beam
reflection mirror optics
Online Access:https://www.mdpi.com/2076-3417/10/7/2611

Internet

https://www.mdpi.com/2076-3417/10/7/2611

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