Effect of impurity source locations on up-down asymmetry in impurity distributions in the ergodic layer of large helical device

A space-resolved spectroscopy using a 3m normal incidence vacuum ultraviolet (VUV) spectrometer was developed to measure the VUV emission profiles in wavelength range of 300–3200Å from impurities in the edge plasmas in Large Helical Device (LHD). The edge plasma of the LHD is characterized by stocha...

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Bibliographic Details
Main Authors: Tetsutarou Oishi, Shigeru Morita, Xianli Huang, Hongming Zhang, Yang Liu, Shuyu Dai, Masahiro Kobayashi, Gakushi Kawamura, Motoshi Goto
Format: Article
Language:English
Published: Elsevier 2017-08-01
Series:Nuclear Materials and Energy
Online Access:http://www.sciencedirect.com/science/article/pii/S2352179116302484