Exploiting CMOS Manufacturing to Reduce Tuning Requirements for Resonant Optical Devices
We present manufacturing tolerances of cascaded silicon microring resonators fabricated in a commercial 130-nm complementary-oxide semiconductor (CMOS) foundry using 193-nm lithography and provide statistics gathered from over 500 four-channel microring arrays over multiple wafers and fabrication lo...
Main Authors: | , , , , , , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
IEEE
2011-01-01
|
Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/6058715/ |