Exploiting CMOS Manufacturing to Reduce Tuning Requirements for Resonant Optical Devices

Exploiting CMOS Manufacturing to Reduce Tuning Requirements for Resonant Optical Devices

We present manufacturing tolerances of cascaded silicon microring resonators fabricated in a commercial 130-nm complementary-oxide semiconductor (CMOS) foundry using 193-nm lithography and provide statistics gathered from over 500 four-channel microring arrays over multiple wafers and fabrication lo...

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Bibliographic Details
Main Authors: Ashok V. Krishnamoorthy, Xuezhe Zheng, Guoliang Li, Jin Yao, Thierry Pinguet, Attila Mekis, Hiren Thacker, Ivan Shubin, Ying Luo, Kannan Raj, John E. Cunningham
Format: Article
Language:English
Published: IEEE 2011-01-01
Series:IEEE Photonics Journal
Subjects:
Silicon nanophotonics
optical interconnects
technologies for computing
Online Access:https://ieeexplore.ieee.org/document/6058715/

Internet

https://ieeexplore.ieee.org/document/6058715/

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