Controlled Al3+ Incorporation in the ZnO Lattice at 188 °C by Soft Reactive Co-Sputtering for Transparent Conductive Oxides

Controlled Al3+ Incorporation in the ZnO Lattice at 188 °C by Soft Reactive Co-Sputtering for Transparent Conductive Oxides

Transparent conductive oxide (TCO) layers, to be implemented in photo-anodes for dye-sensitized solar cells (DSCs), were prepared by co-deposition of ZnO and Al using pulsed-direct current (DC)-magnetron reactive sputtering processes. The films were deposited at low deposition temperatures (RT-188 °...

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Bibliographic Details
Main Authors: Salvatore Sanzaro, Antonino La Magna, Emanuele Smecca, Giovanni Mannino, Giovanna Pellegrino, Enza Fazio, Fortunato Neri, Alessandra Alberti
Format: Article
Language:English
Published: MDPI AG 2016-06-01
Series:Energies
Subjects:
transparent conductive oxide (TCO)
dye-sensitized solar cells (DSCs)
Al doped ZnO (AZO)
co-sputtering
doping
low temperature
Online Access:http://www.mdpi.com/1996-1073/9/6/433

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http://www.mdpi.com/1996-1073/9/6/433

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