MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD
In recent years new types of resist for nano and submicronic lithography are intensively developed. As perspective materials for resist various polymeric compositions on a basis thermally and mechanically resistant polymers are considered. The purpose of the real work was studying of possibility of...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Belarusian National Technical University
2016-06-01
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| Series: | Pribory i Metody Izmerenij |
| Subjects: | |
| Online Access: | https://pimi.bntu.by/jour/article/view/244 |