Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.

Bibliographic Details
Main Authors: F. Torretti, J. Sheil, R. Schupp, M. M. Basko, M. Bayraktar, R. A. Meijer, S. Witte, W. Ubachs, R. Hoekstra, O. O. Versolato, A. J. Neukirch, J. Colgan
Format: Article
Language:English
Published: Nature Publishing Group 2020-05-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-020-15678-y

Internet

https://doi.org/10.1038/s41467-020-15678-y

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