Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition

Films of titanium nitride deposited by physical vapor deposition on 304 L stainless steel substrates were hot isostatic pressed (HIP) under 150 MPa at 550 °C. To study the effects of this treatment on the microstructure of those films, X-ray diffraction analyses, Rutherford Backscattering spectrosco...

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Bibliographic Details
Main Authors: M.J. Carbonari, J.R. Martinelli
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2001-07-01
Series:Materials Research
Subjects:
PVD
HIP
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000300004