RF Magnetron Sputtering Deposition of TiO<sub>2</sub> Thin Films in a Small Continuous Oxygen Flow Rate

RF Magnetron Sputtering Deposition of TiO<sub>2</sub> Thin Films in a Small Continuous Oxygen Flow Rate

Rutile titanium oxide (TiO<sub>2</sub>) thin films require more energy to crystallize than the anatase phase of TiO<sub>2</sub>. It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed g...

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Bibliographic Details
Main Authors: Octavian-Gabriel Simionescu, Cosmin Romanițan, Oana Tutunaru, Valentin Ion, Octavian Buiu, Andrei Avram
Format: Article
Language:English
Published: MDPI AG 2019-07-01
Series:Coatings
Subjects:
room temperature
magnetron sputtering
rutile TiO<sub>2</sub>
Online Access:https://www.mdpi.com/2079-6412/9/7/442

Internet

https://www.mdpi.com/2079-6412/9/7/442

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