Thickness control in electrogenerated mesoporous silica films by wet etching and electrochemical monitoring of the process

Vertically aligned mesoporous silica films can be generated by electrochemically assisted self-assembly (EASA) but the accurate control of their thickness is essentially restricted to the 100 nm range. Here we have developed a wet etching approach using dilute ammonium fluoride to gradually decrease...

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Bibliographic Details
Main Authors: Taisiia Sikolenko, Christelle Despas, Neus Vilà, Alain Walcarius
Format: Article
Language:English
Published: Elsevier 2019-03-01
Series:Electrochemistry Communications
Online Access:http://www.sciencedirect.com/science/article/pii/S138824811930013X