Recognition and Visualization of Lithography Defects based on Transfer Learning

Recognition and Visualization of Lithography Defects based on Transfer Learning

Yield control in the integrated circuit manufacturing process is very important, and defects are one of the main factors affecting chip yield. As the process control becomes more and more critical and the critical dimension becomes smaller and smaller, the identification and location of defects is p...

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Bibliographic Details
Main Authors: Bo Liu, Pengzheng Gao, Libin Zhang, Jiajin Zhang, Yuhong Zhao, Yayi Wei
Format: Article
Language:English
Published: JommPublish 2020-10-01
Series:Journal of Microelectronic Manufacturing
Subjects:
transfer learning
neural network
lithography defects
visualize
grad-cam
Online Access:http://www.jommpublish.org/p/56/

Internet

http://www.jommpublish.org/p/56/

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