Suppression of atom motion and metal deposition in mixed ionic electronic conductors

Suppression of atom motion and metal deposition in mixed ionic electronic conductors

Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stabi...

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Bibliographic Details
Main Authors: Pengfei Qiu, Matthias T. Agne, Yongying Liu, Yaqin Zhu, Hongyi Chen, Tao Mao, Jiong Yang, Wenqing Zhang, Sossina M. Haile, Wolfgang G. Zeier, Jürgen Janek, Ctirad Uher, Xun Shi, Lidong Chen, G. Jeffrey Snyder
Format: Article
Language:English
Published: Nature Publishing Group 2018-07-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-018-05248-8

Internet

https://doi.org/10.1038/s41467-018-05248-8

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