Investigation of SiO2 thin films dielectric constant using ellipsometry technique

In this paper, we studied the optical behavior of SiO2 thin films prepared via sol-gel route using spin coating deposition from tetraethylorthosilicate (TEOS) as precursor. Thin films were annealed at different temperatures (400-600oC). Absorption edge and band gap of thin layers were measured using...

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Bibliographic Details
Main Authors: P Sangpour, K Khosravy, M Kazemzad
Format: Article
Language:English
Published: Isfahan University of Technology 2014-11-01
Series:Iranian Journal of Physics Research
Subjects:
Online Access:http://ijpr.iut.ac.ir/browse.php?a_code=A-10-1-652&slc_lang=en&sid=1