In Situ Growth of ZnO inside a Porous Silicon Matrix Obtained by Electrochemical Etching with a Hydrofluoric Acid-Formaldehyde Solution

In Situ Growth of ZnO inside a Porous Silicon Matrix Obtained by Electrochemical Etching with a Hydrofluoric Acid-Formaldehyde Solution

We present zinc oxide (ZnO) particles obtained inside a porous silicon matrix in the same electrolytic process using a p-type silicon wafer in a hydrofluoric acid (HF) solution containing formaldehyde (CH2O) and hydrated zinc sulfate as additives. The X-ray diffraction pattern of the sample confirme...

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Bibliographic Details
Main Authors: R. Juárez-Nahuatlato, G. García, M. Pacio, Roberto Portillo, N. Perez-Amaro, F. Severiano, G. Nieto, T. Díaz-Becerril, E. Rosendo, R. Romano-Trujillo, A. Coyopol, V. L. Gayou
Format: Article
Language:English
Published: Hindawi Limited 2019-01-01
Series:Journal of Nanomaterials
Online Access:http://dx.doi.org/10.1155/2019/9863145

Internet

http://dx.doi.org/10.1155/2019/9863145

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