Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment

Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The...

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Bibliographic Details
Main Authors: Alba Martínez, Sandra González-Lana, Laura Asín, Jesús M. de la Fuente, Cees W. M. Bastiaansen, Dirk J. Broer, Carlos Sánchez-Somolinos
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Polymers
Subjects:
photopolymers
photoembossing
interference holography
microstructuring
cell alignment
cell morphology
Online Access:https://www.mdpi.com/2073-4360/13/17/2958

Internet

https://www.mdpi.com/2073-4360/13/17/2958

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