Enhanced End-Contacts by Helium Ion Bombardment to Improve Graphene-Metal Contacts

Enhanced End-Contacts by Helium Ion Bombardment to Improve Graphene-Metal Contacts

Low contact resistance between graphene and metals is of paramount importance to fabricate high performance graphene-based devices. In this paper, the impact of both defects induced by helium ion (He+) bombardment and annealing on the contact resistance between graphene and various metals (Ag, Pd, a...

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Bibliographic Details
Main Authors: Kunpeng Jia, Yajuan Su, Jun Zhan, Kashif Shahzad, Huilong Zhu, Chao Zhao, Jun Luo
Format: Article
Language:English
Published: MDPI AG 2016-08-01
Series:Nanomaterials
Subjects:
graphene
contact resistance
helium ion bombardment
defects
end-contact
Online Access:http://www.mdpi.com/2079-4991/6/9/158

Internet

http://www.mdpi.com/2079-4991/6/9/158

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