Negative-tone molecular glass photoresist for high-resolution electron beam lithography
A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
The Royal Society
2021-03-01
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| Series: | Royal Society Open Science |
| Subjects: | |
| Online Access: | https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.202132 |