Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm
A new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2019-01-01
|
| Series: | EPJ Web of Conferences |
| Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_03004.pdf |