Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH<sub>4</sub> Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH<sub>4</sub> Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

As the application of nanotechnology increases continuously, the need for controlled size nanoparticles also increases. Therefore, in this work, we discussed the growth mechanism of carbon nanoparticles generated in Ar+CH<sub>4</sub> multi-hollow discharge plasmas. Using the plasmas, we...

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Bibliographic Details
Main Authors: Sung Hwa Hwang, Kazunori Koga, Yuan Hao, Pankaj Attri, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, Tatsuyuki Nakatani
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Processes
Subjects:
plasma chemical vapor deposition
carbon nanoparticle
coagulation
optical emission spectroscopy
Online Access:https://www.mdpi.com/2227-9717/9/1/2

Internet

https://www.mdpi.com/2227-9717/9/1/2

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