A high entropy silicide by reactive spark plasma sintering

Abstract A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive sp...

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Bibliographic Details
Main Authors: Yuan Qin, Ji-Xuan Liu, Fei Li, Xiaofeng Wei, Houzheng Wu, Guo-Jun Zhang
Format: Article
Language:English
Published: SpringerOpen 2019-03-01
Series:Journal of Advanced Ceramics
Subjects:
Online Access:http://link.springer.com/article/10.1007/s40145-019-0319-3