Dose-Modulated Maskless Lithography for the Efficient Fabrication of Compound Eyes With Enlarged Field-of-View
In this paper, a method of dose-modulated maskless lithography (DMML) with high efficiency for the fabrication of a special compound-eyes array with enlarged field-of-view is proposed. Before the fabrication process, practical measurements were primarily conducted to quantify the dose-modulated effe...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2019-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/8695764/ |