Control of gas concentration distribution in a semiconductor process chamber using CT-TDLAS measurement
Methane (CH4) concentration distribution in a semiconductor process chamber was controlled using the measurement of computed tomography-tunable diode laser absorption spectroscopy (CT-TDLAS) and the feedback control toward the feeding CH4 concentrations and flow rates. CH4 diluted with nitrogen was...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2021-02-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0037758 |