NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I
Current distribution of copper electrodeposition in a trench (at different flow conditions) was studied taking into consideration the effect of hydrogen evolution. Due to pH effect on solubility of Cu+2 ions and the feasibility to precipitate as hydroxides at high pH, thus the importance of such stu...
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doaj-85f0fdc464f541e9be55e7ff9a8bc9862020-11-25T01:32:25ZengTaylor's UniversityJournal of Engineering Science and Technology1823-46902017-04-0112410221036NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I WATHEQ NASER HUSSEIN0Babylon University, College of Engineering, IraqCurrent distribution of copper electrodeposition in a trench (at different flow conditions) was studied taking into consideration the effect of hydrogen evolution. Due to pH effect on solubility of Cu+2 ions and the feasibility to precipitate as hydroxides at high pH, thus the importance of such study was handled. The results showed that the deposition in general was non uniform along the lateral walls, the non-uniformity not affected by current or flow velocity. Velocity not affect H+ concentration inside the trench and its value remained the same as that for the initial one meaning that Cu hydroxide precipitate was not possible. http://jestec.taylors.edu.my/Vol%2012%20issue%204%20April%202017/12_4_12.pdfCurrent distributionModelingComsolElectrodepositionCopperTrench. |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
WATHEQ NASER HUSSEIN |
spellingShingle |
WATHEQ NASER HUSSEIN NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I Journal of Engineering Science and Technology Current distribution Modeling Comsol Electrodeposition Copper Trench. |
author_facet |
WATHEQ NASER HUSSEIN |
author_sort |
WATHEQ NASER HUSSEIN |
title |
NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I |
title_short |
NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I |
title_full |
NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I |
title_fullStr |
NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I |
title_full_unstemmed |
NUMERICAL SIMULATION OF PH EFFECT ON COPPER ELECTRODEPOSITION INSIDE INSULATED TRENCH - PART I |
title_sort |
numerical simulation of ph effect on copper electrodeposition inside insulated trench - part i |
publisher |
Taylor's University |
series |
Journal of Engineering Science and Technology |
issn |
1823-4690 |
publishDate |
2017-04-01 |
description |
Current distribution of copper electrodeposition in a trench (at different flow conditions) was studied taking into consideration the effect of hydrogen evolution. Due to pH effect on solubility of Cu+2 ions and the feasibility to precipitate as hydroxides at high pH, thus the importance of such study was handled. The results showed that the deposition in general was non uniform along the lateral walls, the non-uniformity not affected by current or flow velocity. Velocity not affect H+ concentration inside the trench and its value remained the same as that for the initial one meaning that Cu hydroxide precipitate was not possible.
|
topic |
Current distribution Modeling Comsol Electrodeposition Copper Trench. |
url |
http://jestec.taylors.edu.my/Vol%2012%20issue%204%20April%202017/12_4_12.pdf |
work_keys_str_mv |
AT watheqnaserhussein numericalsimulationofpheffectoncopperelectrodepositioninsideinsulatedtrenchparti |
_version_ |
1725082192576512000 |