Based on Hot Embossing Lithography Preparation of High-Precision Micron-Level Pattern
Compared with UV embossing and micro-contact imprinting, hot embossing technology is the first to be used in nano-imprint lithography, and is access to copying the parallel structure in micro-nano-scale at low cost and relatively faster speed. This paper explores which factors influence some pattern...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IFSA Publishing, S.L.
2014-03-01
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| Series: | Sensors & Transducers |
| Subjects: | |
| Online Access: | http://www.sensorsportal.com/HTML/DIGEST/march_2014/Vol_166/P_1931.pdf |