1320 nm Light Source From Deuterium Treated Silicon
We report an efficient room temperature photon source at 1320 nm telecommunication wavelength from nanostructured silicon surface. The activation of this light source was realized by treating the surface of Si wafer by vapor of heavy water (D2O) containing a mixture of hydrofluoric and nitric acids....
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| Format: | Article |
| Language: | English |
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IEEE
2020-01-01
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| Series: | IEEE Open Journal of Nanotechnology |
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| Online Access: | https://ieeexplore.ieee.org/document/9200733/ |