Deposition of thin film of titanium on ceramic substrate using the discharge for hollow cathode for Al2O3/Al2O3 indirect brazing

Deposition of thin film of titanium on ceramic substrate using the discharge for hollow cathode for Al2O3/Al2O3 indirect brazing

Thin films of titanium were deposited onto Al2O3 substrate by hollow cathode discharge method for the formation of a ceramic-ceramic joint using indirect brazing method. An advantage of using this technique is that a relatively small amount of titanium is required for the metallization of the cerami...

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Bibliographic Details
Main Authors: Mary Roberta Meira Marinho, Theophilo Moura Maciel, Walman Benício Castro, Edalmy Oliveira Almeida, Clodomiro Alves Jr
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2009-01-01
Series:Materials Research
Subjects:
indirect brazing
Al2O3
metallization
hollow cathode technique
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392009000400008

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392009000400008

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