Optimal Conditions for the Deposition of Gold Nanofilms on a Silicon by Galvanic Replacement Method

<p class="1">The formation conditions of gold nanofilms on a silicon (Si) substrate by galvanic replacement in a dimethyl sulfoxide (DMSO) solvent and their subsequent use for the fabrication of Si nanostructures by metal-assisted chemical etching (MACE) method were under study. We f...

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Bibliographic Details
Main Authors: S. I. Nichkalo, M. V. Shepida, M. V. Chekaylo
Format: Article
Language:English
Published: Vasyl Stefanyk Precarpathian National University 2019-10-01
Series:Фізика і хімія твердого тіла
Subjects:
Online Access:http://journals.pu.if.ua/index.php/pcss/article/view/3908