Research on the Surface Evolution of Single Crystal Silicon Mirror Contaminated by Metallic Elements during Elastic Jet Polishing Techniques

Research on the Surface Evolution of Single Crystal Silicon Mirror Contaminated by Metallic Elements during Elastic Jet Polishing Techniques

Metallic elements can contaminate single crystal silicon mirror during ion beam etching (IBE) and other postprocessing methods, which can affect the performance of components in an infrared laser system. In this work, scanning electron microscope (SEM) and atomic force microscope (AFM) were used to...

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Bibliographic Details
Main Authors: Wanli Zhang, Feng Shi, Yifan Dai, Yaoyu Zhong, Ci Song, Ye Tian
Format: Article
Language:English
Published: MDPI AG 2019-04-01
Series:Materials
Subjects:
single crystal silicon
metallic contaminant
EJP
SAE
surface quality
infrared laser system
Online Access:https://www.mdpi.com/1996-1944/12/7/1077

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https://www.mdpi.com/1996-1944/12/7/1077

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