Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering
The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO<sub>2</sub>) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO<su...
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doaj-8ca2b39621b946afbeef5b879cd51fe22020-11-24T21:59:12ZengMDPI AGCoatings2079-64122019-02-019210610.3390/coatings9020106coatings9020106Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron SputteringArtur Wiatrowski0Agata Obstarczyk1Michał Mazur2Danuta Kaczmarek3Damian Wojcieszak4Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandFaculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandFaculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandFaculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandFaculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandThe aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO<sub>2</sub>) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO<sub>2</sub> films’ microstructure. As-deposited hafnia thin films exhibit nanocrystalline structure with a monoclinic phase, however the rise of the sputtering power results in an increase of crystallite sizes. Atomic force microscopy investigations show that the surface of the deposited films is smooth, crack-free, and composed of visible grains. The surface roughness and the value of the water contact angle increase with the increase of the sputtering power. Measurements of the optical properties show that HfO<sub>2</sub> coatings are transparent in the visible wavelength range. A higher sputtering power causes a decrease of an average transmittance level and a simultaneous increase of the real part of the refractive index. Nanoindentation measurements reveal that the thin film hardness and Young’s elastic modulus increase with an increase in the sputtering power. Moreover, the results of plasticity index <i>H</i>/<i>E</i> and plastic resistance parameter <i>H</i><sup>3</sup>/<i>E</i><sup>2</sup> are discussed. Based on the obtained results, a correlation between the sputtering power and the structural, surface, and optical properties, as well as the hardness and Young’s elastic modulus, were determined.https://www.mdpi.com/2079-6412/9/2/106HfO<sub>2</sub> thin filmssputteringsurface propertieshardnessYoung’s elastic modulus |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Artur Wiatrowski Agata Obstarczyk Michał Mazur Danuta Kaczmarek Damian Wojcieszak |
spellingShingle |
Artur Wiatrowski Agata Obstarczyk Michał Mazur Danuta Kaczmarek Damian Wojcieszak Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering Coatings HfO<sub>2</sub> thin films sputtering surface properties hardness Young’s elastic modulus |
author_facet |
Artur Wiatrowski Agata Obstarczyk Michał Mazur Danuta Kaczmarek Damian Wojcieszak |
author_sort |
Artur Wiatrowski |
title |
Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering |
title_short |
Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering |
title_full |
Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering |
title_fullStr |
Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering |
title_full_unstemmed |
Characterization of HfO<sub>2</sub> Optical Coatings Deposited by MF Magnetron Sputtering |
title_sort |
characterization of hfo<sub>2</sub> optical coatings deposited by mf magnetron sputtering |
publisher |
MDPI AG |
series |
Coatings |
issn |
2079-6412 |
publishDate |
2019-02-01 |
description |
The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO<sub>2</sub>) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO<sub>2</sub> films’ microstructure. As-deposited hafnia thin films exhibit nanocrystalline structure with a monoclinic phase, however the rise of the sputtering power results in an increase of crystallite sizes. Atomic force microscopy investigations show that the surface of the deposited films is smooth, crack-free, and composed of visible grains. The surface roughness and the value of the water contact angle increase with the increase of the sputtering power. Measurements of the optical properties show that HfO<sub>2</sub> coatings are transparent in the visible wavelength range. A higher sputtering power causes a decrease of an average transmittance level and a simultaneous increase of the real part of the refractive index. Nanoindentation measurements reveal that the thin film hardness and Young’s elastic modulus increase with an increase in the sputtering power. Moreover, the results of plasticity index <i>H</i>/<i>E</i> and plastic resistance parameter <i>H</i><sup>3</sup>/<i>E</i><sup>2</sup> are discussed. Based on the obtained results, a correlation between the sputtering power and the structural, surface, and optical properties, as well as the hardness and Young’s elastic modulus, were determined. |
topic |
HfO<sub>2</sub> thin films sputtering surface properties hardness Young’s elastic modulus |
url |
https://www.mdpi.com/2079-6412/9/2/106 |
work_keys_str_mv |
AT arturwiatrowski characterizationofhfosub2subopticalcoatingsdepositedbymfmagnetronsputtering AT agataobstarczyk characterizationofhfosub2subopticalcoatingsdepositedbymfmagnetronsputtering AT michałmazur characterizationofhfosub2subopticalcoatingsdepositedbymfmagnetronsputtering AT danutakaczmarek characterizationofhfosub2subopticalcoatingsdepositedbymfmagnetronsputtering AT damianwojcieszak characterizationofhfosub2subopticalcoatingsdepositedbymfmagnetronsputtering |
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1725848321655832576 |