A universal method for depositing patterned materials in situ
Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping.
Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Nature Publishing Group
2020-10-01
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Series: | Nature Communications |
Online Access: | https://doi.org/10.1038/s41467-020-19210-0 |