Cross-Coupled Repetitive Control of a Compliant Nanomanipulator for Micro-Stereolithography

Cross-Coupled Repetitive Control of a Compliant Nanomanipulator for Micro-Stereolithography

This paper proposes an easy-implemented and high precision contouring control method for a self-developed compliant nanomanipulator supporting cost-effective micro-stereolithography (MSL). The proposed contouring control method is composed of a repetitive controller (RC) to achieve periodic trajecto...

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Bibliographic Details
Main Authors: Yue Cao, Zhen Zhang
Format: Article
Language:English
Published: IEEE 2020-01-01
Series:IEEE Access
Subjects:
Contouring control
nano-positioning
mechatronics
tracking
micro-stereolithography
Online Access:https://ieeexplore.ieee.org/document/8945185/

Internet

https://ieeexplore.ieee.org/document/8945185/

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