Intermittent Very High Frequency Plasma Deposition on Microcrystalline Silicon Solar Cells Enabling High Conversion Efficiency

Intermittent Very High Frequency Plasma Deposition on Microcrystalline Silicon Solar Cells Enabling High Conversion Efficiency

Stopping the plasma-enhanced chemical vapor deposition (PECVD) once and maintaining the film in a vacuum for 30 s were performed. This was done several times during the formation of a film of i-layer microcrystalline silicon (μc-Si:H) used in thin-film silicon tandem solar cells. This process aimed...

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Bibliographic Details
Main Authors: Mitsuoki Hishida, Takeyuki Sekimoto, Mitsuhiro Matsumoto, Akira Terakawa
Format: Article
Language:English
Published: MDPI AG 2016-01-01
Series:Energies
Subjects:
thin-film silicon tandem solar cell
microcrystalline silicon
amorphous silicon
crystallinity
plasma-enhanced chemical vapor deposition
conversion efficiency
Online Access:http://www.mdpi.com/1996-1073/9/1/42

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http://www.mdpi.com/1996-1073/9/1/42

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