On the Dependence of Band Alignment of SiO₂/Si Stack on SiO₂ Thickness: Extrinsic Or Intrinsic?
The dependence of band alignment of SiO<sub>2</sub>/Si stack on SiO<sub>2</sub> thickness is restudied. The band structure of SiO<sub>2</sub>/Si stack is investigated by time-dependent X-ray photoelectron spectroscopy (XPS) with and without electron-compensation t...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2020-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9179739/ |