Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule
In the present study, we quantitatively evaluated dielectric breakdown in silicon-based micro- and nanofluidic devices under practical electrophoretic conditions by changing the thickness of the insulating layer. At higher buffer concentration, a silicon nanofluidic device with a 100 nm or 250 nm si...
Main Authors: | , , , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-04-01
|
Series: | Micromachines |
Subjects: | |
Online Access: | http://www.mdpi.com/2072-666X/9/4/180 |
id |
doaj-93610e3bd06b4bfc934cd6a8ce4d7fac |
---|---|
record_format |
Article |
spelling |
doaj-93610e3bd06b4bfc934cd6a8ce4d7fac2020-11-24T21:03:09ZengMDPI AGMicromachines2072-666X2018-04-019418010.3390/mi9040180mi9040180Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA MoleculeMamiko Sano0Noritada Kaji1Qiong Wu2Toyohiro Naito3Takao Yasui4Masateru Taniguchi5Tomoji Kawai6Yoshinobu Baba7Department of Biomolecular Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, JapanDepartment of Applied Chemistry, Graduate School of Engineering, Kyushu University, Moto-oka 744, Nishi-ku, Fukuoka 819-0395, JapanDepartment of Biomolecular Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, JapanGraduate School of Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, JapanDepartment of Biomolecular Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, JapanInstitute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka-cho, Ibaraki, Osaka 567-0047, JapanInstitute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka-cho, Ibaraki, Osaka 567-0047, JapanDepartment of Biomolecular Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, JapanIn the present study, we quantitatively evaluated dielectric breakdown in silicon-based micro- and nanofluidic devices under practical electrophoretic conditions by changing the thickness of the insulating layer. At higher buffer concentration, a silicon nanofluidic device with a 100 nm or 250 nm silicon dioxide layer tolerated dielectric breakdown up to ca. 10 V/cm, thereby allowing successful electrophoretic migration of a single DNA molecule through a nanochannel. The observed DNA migration behavior suggested that parameters, such as thickness of the insulating layer, tolerance of dielectric breakdown, and bonding status of silicon and glass substrate, should be optimized to achieve successful electrophoretic transport of a DNA molecule through a nanopore for nanopore-based DNA sequencing applications.http://www.mdpi.com/2072-666X/9/4/180dielectric breakdowninsulationsilicon devicesDNAelectrophoresis |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Mamiko Sano Noritada Kaji Qiong Wu Toyohiro Naito Takao Yasui Masateru Taniguchi Tomoji Kawai Yoshinobu Baba |
spellingShingle |
Mamiko Sano Noritada Kaji Qiong Wu Toyohiro Naito Takao Yasui Masateru Taniguchi Tomoji Kawai Yoshinobu Baba Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule Micromachines dielectric breakdown insulation silicon devices DNA electrophoresis |
author_facet |
Mamiko Sano Noritada Kaji Qiong Wu Toyohiro Naito Takao Yasui Masateru Taniguchi Tomoji Kawai Yoshinobu Baba |
author_sort |
Mamiko Sano |
title |
Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule |
title_short |
Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule |
title_full |
Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule |
title_fullStr |
Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule |
title_full_unstemmed |
Quantitative Evaluation of Dielectric Breakdown of Silicon Micro- and Nanofluidic Devices for Electrophoretic Transport of a Single DNA Molecule |
title_sort |
quantitative evaluation of dielectric breakdown of silicon micro- and nanofluidic devices for electrophoretic transport of a single dna molecule |
publisher |
MDPI AG |
series |
Micromachines |
issn |
2072-666X |
publishDate |
2018-04-01 |
description |
In the present study, we quantitatively evaluated dielectric breakdown in silicon-based micro- and nanofluidic devices under practical electrophoretic conditions by changing the thickness of the insulating layer. At higher buffer concentration, a silicon nanofluidic device with a 100 nm or 250 nm silicon dioxide layer tolerated dielectric breakdown up to ca. 10 V/cm, thereby allowing successful electrophoretic migration of a single DNA molecule through a nanochannel. The observed DNA migration behavior suggested that parameters, such as thickness of the insulating layer, tolerance of dielectric breakdown, and bonding status of silicon and glass substrate, should be optimized to achieve successful electrophoretic transport of a DNA molecule through a nanopore for nanopore-based DNA sequencing applications. |
topic |
dielectric breakdown insulation silicon devices DNA electrophoresis |
url |
http://www.mdpi.com/2072-666X/9/4/180 |
work_keys_str_mv |
AT mamikosano quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT noritadakaji quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT qiongwu quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT toyohironaito quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT takaoyasui quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT masaterutaniguchi quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT tomojikawai quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule AT yoshinobubaba quantitativeevaluationofdielectricbreakdownofsiliconmicroandnanofluidicdevicesforelectrophoretictransportofasinglednamolecule |
_version_ |
1716774026533142528 |