Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film
Yttrium fluoride (YF<sub>3</sub>) films were grown on sapphire substrate by a radio frequency magnetron using a commercial ceramic target in a vacuum chamber. The structure, composition, and plasma etching behavior of the films were systematically investigated. The YF<sub>3</sub...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2018-11-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/8/11/936 |