Generation of Charged Ti Nanoparticles and Their Deposition Behavior with a Substrate Bias during RF Magnetron Sputtering

This study is based on the film growth by non-classical crystallization, where charged nanoparticles (NPs) are the building block of film deposition. Extensive studies about the generation of charged NPs and their contribution to film deposition have been made in the chemical vapor deposition (CVD)...

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Bibliographic Details
Main Authors: Ji-Hye Kwon, Du-Yun Kim, Nong-Moon Hwang
Format: Article
Language:English
Published: MDPI AG 2020-04-01
Series:Coatings
Subjects:
Ti
Online Access:https://www.mdpi.com/2079-6412/10/5/443