Spectroscopic Properties of Si-nc in SiO<sub>x</sub> Films Using HFCVD

Spectroscopic Properties of Si-nc in SiO<sub>x</sub> Films Using HFCVD

In the present work, non-stoichiometric silicon oxide films (SiO<sub>x</sub>) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential applications of SiO<sub>x<...

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Bibliographic Details
Main Authors: Zaira Jocelyn Hernández Simón, Jose Alberto Luna López, Alvaro David Hernández de la Luz, Sergio Alfonso Pérez García, Alfredo Benítez Lara, Godofredo García Salgado, Jesus Carrillo López, Gabriel Omar Mendoza Conde, Hayde Patricia Martínez Hernández
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Nanomaterials
Subjects:
SiO<sub>x</sub> films
Si-ncs
band gap engineering
spectroscopic characterizations
ellipsometric spectroscopy
photoluminescence
Online Access:https://www.mdpi.com/2079-4991/10/7/1415

Internet

https://www.mdpi.com/2079-4991/10/7/1415

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