Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

The hot and dense plasma formed in modified dense plasma focus (DPF) device has been used worldwide for the nanofabrication of several materials. In this paper, we summarize the fabrication of III–V semiconductor nanostructures using the high fluence material ions produced by hot, dense and extremel...

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Bibliographic Details
Main Authors: Onkar Mangla, Savita Roy, Kostya (Ken) Ostrikov
Format: Article
Language:English
Published: MDPI AG 2015-12-01
Series:Nanomaterials
Subjects:
III–V semiconductors
nanofabrication
dense plasma focus
rapid thermal annealing
photoluminescence
transmittance
Online Access:http://www.mdpi.com/2079-4991/6/1/4

Internet

http://www.mdpi.com/2079-4991/6/1/4

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