Tunneling Magnetoresistance (TMR) on Fe-Al2O3 Nano Granular Film Growth by Helicon Plasma Sputtering

Tunneling Magnetoresistance (TMR) on Fe-Al2O3 Nano Granular Film Growth by Helicon Plasma Sputtering

Fe-Al2O3 nanogranular thin film by helicon plasma sputtering with the variation of Fe content from 0.1 to 0.7 volume fraction have been prepared. The magnetic and magnetoresistance properties were investigated by a Vibrating Sample Magnetometer (VSM) and a Four Point Probe (FPP). The Rutherford Back...

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Bibliographic Details
Main Author: S. Purwanto
Format: Article
Language:English
Published: Center for Development of Nuclear Informatics, National Nuclear Energy Agency (BATAN) 2008-01-01
Series:Atom Indonesia
Subjects:
Nanogranular thin film
Helicon plasma sputtering
Tunneling magnetoresistanc
Conversion electron mossbauer spectroscopy;
Rutherford back scattering (RBS)
Online Access:http://aij.batan.go.id/index.php/aij/article/view/90

Internet

http://aij.batan.go.id/index.php/aij/article/view/90

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