Growth and Physical Structure of Amorphous Boron Carbide Deposited by Magnetron Sputtering on a Silicon Substrate with a Titanium Interlayer

Growth and Physical Structure of Amorphous Boron Carbide Deposited by Magnetron Sputtering on a Silicon Substrate with a Titanium Interlayer

Multilayer amorphous boron carbide coatings were produced by radiofrequency magnetron sputtering on silicon substrates. To improve the adhesion, titanium interlayers with different thickness were interposed between the substrate and the coating. Above three hundreds nanometer, the enhanced roughness...

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Bibliographic Details
Main Authors: Roberto Caniello, Espedito Vassallo, Anna Cremona, Giovanni Grosso, David Dellasega, Maurizio Canetti, Enrico Miorin
Format: Article
Language:English
Published: CTU Central Library 2013-01-01
Series:Acta Polytechnica
Subjects:
boron carbide
magnetron sputtering
titanium
interlayer
scratch test.
Online Access:https://ojs.cvut.cz/ojs/index.php/ap/article/view/1729

Internet

https://ojs.cvut.cz/ojs/index.php/ap/article/view/1729

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