Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects

Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects

The study was devoted to optical characterization of non-stoichiometric silicon nitride films prepared by reactive magnetron sputtering in argon-nitrogen atmosphere onto cold (unheated) substrates. It was found that these films exhibit the combination of three defects: optical inhomogeneity (refract...

Full description

Bibliographic Details
Main Authors: Jiří Vohánka, Ivan Ohlídal, Miloslav Ohlídal, Štěpán Šustek, Martin Čermák, Václav Šulc, Petr Vašina, Jaroslav Ženíšek, Daniel Franta
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Coatings
Subjects:
silicon nitride
optical characterization
ellipsometry
inhomogeneous films
optical anisotropy
Online Access:https://www.mdpi.com/2079-6412/9/7/416

Internet

https://www.mdpi.com/2079-6412/9/7/416

Similar Items