Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation
TiO2 thin films of a rutile, an anatase, and a mixture type with anatase and rutile were fabricated by a magnetron sputtering method. The fabricated films were irradiated by N+ ions with several doses using the Freeman ion source. Atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoel...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2012-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2012/923769 |