Erratum: “An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process” [AIP Advances 5, 117145 (2015)]

Bibliographic Details
Main Authors: Takeshi Nagase, Ryo Yamashita, Atsushi Yabuuchi, Jung-Goo Lee
Format: Article
Language:English
Published: AIP Publishing LLC 2015-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4938093