Residual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithography
The nanoimprinting of polymer solar cells via soft lithography is an attractive approach for enhancing light absorption in the active layer. Many efficient polymer solar cells utilize a high boiling point solvent additive such as 1,8-diiodooctane (DIO) during active layer deposition to optimize morp...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2019-06-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5109140 |