Residual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithography

Residual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithography

The nanoimprinting of polymer solar cells via soft lithography is an attractive approach for enhancing light absorption in the active layer. Many efficient polymer solar cells utilize a high boiling point solvent additive such as 1,8-diiodooctane (DIO) during active layer deposition to optimize morp...

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Bibliographic Details
Main Authors: Chao Wang, Eliot Gann, Anthony S. R. Chesman, Christopher R. McNeill
Format: Article
Language:English
Published: AIP Publishing LLC 2019-06-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5109140

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