Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements

Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements

We investigated the possibility of employing refractive index (RI) measurements for inline incoming slurry control at the point of use (POU), as an alternative to the widespread densitometry method. As such, it became necessary to determine if RI could detect smaller changes in slurry composition an...

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Bibliographic Details
Main Authors: Leticia Vazquez Bengochea, Yasa Sampurno, Marcus Kavaljer, Rob Johnston, Ara Philipossian
Format: Article
Language:English
Published: MDPI AG 2018-10-01
Series:Micromachines
Subjects:
semiconductor technology
chemical mechanical planarization
slurry characterization
in-line monitoring and control
Online Access:https://www.mdpi.com/2072-666X/9/11/542

Internet

https://www.mdpi.com/2072-666X/9/11/542

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