The Vacancy Pool Model for Amorphous In-Ga-Zn-O Thin-Film Transistors

In this paper, the reaction rate of oxygen vacancy (VO) by the derivatives of threshold voltage (Vth) in the amorphous indium-gallium-zinc oxide thin-film transistors under light pulses with altering duty ratios is investigated. More importantly, after collecting and analyzing a lot of experimental...

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Bibliographic Details
Main Authors: Ya-Hsiang Tai, Han-Wen Liu, Po-Chun Chan
Format: Article
Language:English
Published: IEEE 2019-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8491384/